Optical properties of InGaAsN quantum well-based microlasers passivated by SiO <sub>2</sub> sol–gel film

Low-temperature, plasma-free method of sol-gel SiO<sub>2</sub> passivation coating film was applied to InGaAsN quantum well microlasers emitting in the 1.2 µm spectral range. A marked enhancement in their optical performance under optical pumping and current injection was found. For optically pumped microlasers, room-temperature lasing was achieved along with a substantial increase in photoluminescence intensity. In the case of electrically injected microlasers, the threshold current density was significantly reduced from 45.8 kA/cm<sup>2</sup> to 20.1 kA/cm<sup>2</sup>. The demonstrated approach offers broad prospects for the development of high-performance InGaAs(N) microlasers for applications in nanophotonics and optoelectronics.

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Publication Details

Journal
Optics Letters
Published
2025-10-09
DOI
https://doi.org/10.1364/ol.577745
Primary Topic
Photonic and Optical Devices
Type
article
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article

Optical properties of InGaAsN quantum well-based microlasers passivated by SiO 2 sol–gel film

Ivan Melnichenko, Talgat Shugabaev, Vladislav O. Gridchin, A. E. Zhukov et al.
Optics Letters
Photonic and Optical Devices
article

Optical properties of InGaAsN quantum well-based microlasers passivated by SiO 2 sol–gel film

Ivan Melnichenko, Talgat Shugabaev, Vladislav O. Gridchin, A. E. Zhukov, Nikita Fominykh, Ivan Makhov, E. I. Moiseev, M. M. Kulagina, N. V. Kryzhanovskaya
article en

Abstract

Low-temperature, plasma-free method of sol-gel SiO<sub>2</sub> passivation coating film was applied to InGaAsN quantum well microlasers emitting in the 1.2 µm spectral range. A marked enhancement in their optical performance under optical pumping and current injection was found. For optically pumped microlasers, room-temperature lasing was achieved along with a substantial increase in photoluminescence intensity. In the case of electrically injected microlasers, the threshold current density was significantly reduced from 45.8 kA/cm<sup>2</sup> to 20.1 kA/cm<sup>2</sup>. The demonstrated approach offers broad prospects for the development of high-performance InGaAs(N) microlasers for applications in nanophotonics and optoelectronics.

Optics LettersVol. 50(21)
St Petersburg University (RU), Institute for Analytical Instrumentation (RU), Ioffe Institute (RU)
Openalex Percentile: Top 72%
Photonic and Optical Devices
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Optical properties of InGaAsN quantum well-based microlasers passivated by SiO <sub>2</sub> sol–gel film — Ivan Melnichenko, Talgat Shugabaev, et al. · Optics Letters (2025) | TGRS Research Map | TGRS