Chemical termination and interfacial redox behavior of freestanding SrTiO3
Tailoring oxide heterointerfaces has sparked the search for electronic and ionic phenomena in low-dimensional, confined systems. The fabrication of freestanding oxide membranes has further expanded the possible fields of application. Based on the structural vulnerability and physical confinement of such membranes, it remains a great challenge to achieve atomically defined and single-terminated surfaces by the typical chemical treatments and to induce interfacial redox-reactions in these nanoscopic transition metal oxides. To address this, we use the sacrificial layer exfoliation route, involving an all-perovskite epitaxial layer structure to fabricate freestanding [Formula: see text] membranes with high crystallinity and defined surface morphology. To study the interfacial redox-behavior of the singly [Formula: see text]-terminated, annealed membrane, we employ the formation of oxygen vacancies in [Formula: see text], triggered by the low-pressure deposition of a thin [Formula: see text] layer epitaxially grown on the transferred [Formula: see text] layer. A mixed Ti[Formula: see text] valence state is indicative of the induced transfer of oxygen ions from the confined [Formula: see text] membrane into the [Formula: see text] overlayer, resulting in an oxygen vacancy concentration of around [Formula: see text] in the confined [Formula: see text] membrane. Our results highlight that interfacial redox-reactions can be induced in [Formula: see text] membranes, which enables the ionic engineering of confined oxide heterointerfaces based on the freestanding oxide approach.
Authors
- Marcus Wohlgemuth (ORCID: https://orcid.org/0009-0002-0362-5359)
- Alexandros Sarantopoulos (ORCID: https://orcid.org/0000-0002-1179-3195)
- Felix Gunkel (ORCID: https://orcid.org/0000-0003-1178-9986)
- Joachim Dahl Thomsen (ORCID: https://orcid.org/0000-0003-0095-1191)
- J. Santamarı́a (ORCID: https://orcid.org/0000-0003-4594-2686)
- Regina Dittmann (ORCID: https://orcid.org/0000-0003-1886-1864)
- Lisa Heymann (ORCID: https://orcid.org/0000-0002-0207-7840)
- V. Rouco (ORCID: https://orcid.org/0000-0001-8751-8643)
- Rafal E. Dunin–Borkowski (ORCID: https://orcid.org/0000-0001-8082-0647)
- Lin Huang (ORCID: https://orcid.org/0000-0003-4032-7254)
- K. Nayak
- Anton Kaus (ORCID: https://orcid.org/0009-0004-0070-1795)
Institutions
- Universidad Complutense de Madrid (ES)
- Forschungszentrum Jülich (DE)
- Ernst Ruska Centre (DE)
- Jülich Aachen Research Alliance (DE)
Publication Details
- Journal
- Scientific Reports
- Published
- 2025-10-09
- DOI
- https://doi.org/10.1038/s41598-025-15902-z
- Citations
- 1
- Primary Topic
- Electronic and Structural Properties of Oxides
- Type
- article
- Field-Weighted Citation Impact
- 0.52
Funders
- Deutsche Forschungsgemeinschaft
- Bundesministerium für Bildung und Forschung