Chemical termination and interfacial redox behavior of freestanding SrTiO3

Tailoring oxide heterointerfaces has sparked the search for electronic and ionic phenomena in low-dimensional, confined systems. The fabrication of freestanding oxide membranes has further expanded the possible fields of application. Based on the structural vulnerability and physical confinement of such membranes, it remains a great challenge to achieve atomically defined and single-terminated surfaces by the typical chemical treatments and to induce interfacial redox-reactions in these nanoscopic transition metal oxides. To address this, we use the sacrificial layer exfoliation route, involving an all-perovskite epitaxial layer structure to fabricate freestanding [Formula: see text] membranes with high crystallinity and defined surface morphology. To study the interfacial redox-behavior of the singly [Formula: see text]-terminated, annealed membrane, we employ the formation of oxygen vacancies in [Formula: see text], triggered by the low-pressure deposition of a thin [Formula: see text] layer epitaxially grown on the transferred [Formula: see text] layer. A mixed Ti[Formula: see text] valence state is indicative of the induced transfer of oxygen ions from the confined [Formula: see text] membrane into the [Formula: see text] overlayer, resulting in an oxygen vacancy concentration of around [Formula: see text] in the confined [Formula: see text] membrane. Our results highlight that interfacial redox-reactions can be induced in [Formula: see text] membranes, which enables the ionic engineering of confined oxide heterointerfaces based on the freestanding oxide approach.

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Publication Details

Journal
Scientific Reports
Published
2025-10-09
DOI
https://doi.org/10.1038/s41598-025-15902-z
Citations
1
Primary Topic
Electronic and Structural Properties of Oxides
Type
article
Field-Weighted Citation Impact
0.52

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article

Chemical termination and interfacial redox behavior of freestanding SrTiO3

Marcus Wohlgemuth, Alexandros Sarantopoulos, Felix Gunkel, Joachim Dahl Thomsen et al.
1 citations
Scientific Reports
Electronic and Structural Properties of Oxides
0.52
article

Chemical termination and interfacial redox behavior of freestanding SrTiO3

Marcus Wohlgemuth, Alexandros Sarantopoulos, Felix Gunkel, Joachim Dahl Thomsen, J. Santamarı́a, Regina Dittmann, Lisa Heymann, V. Rouco, Rafal E. Dunin–Borkowski, Lin Huang, K. Nayak, Anton Kaus
article en
1 citations

Abstract

Tailoring oxide heterointerfaces has sparked the search for electronic and ionic phenomena in low-dimensional, confined systems. The fabrication of freestanding oxide membranes has further expanded the possible fields of application. Based on the structural vulnerability and physical confinement of such membranes, it remains a great challenge to achieve atomically defined and single-terminated surfaces by the typical chemical treatments and to induce interfacial redox-reactions in these nanoscopic transition metal oxides. To address this, we use the sacrificial layer exfoliation route, involving an all-perovskite epitaxial layer structure to fabricate freestanding [Formula: see text] membranes with high crystallinity and defined surface morphology. To study the interfacial redox-behavior of the singly [Formula: see text]-terminated, annealed membrane, we employ the formation of oxygen vacancies in [Formula: see text], triggered by the low-pressure deposition of a thin [Formula: see text] layer epitaxially grown on the transferred [Formula: see text] layer. A mixed Ti[Formula: see text] valence state is indicative of the induced transfer of oxygen ions from the confined [Formula: see text] membrane into the [Formula: see text] overlayer, resulting in an oxygen vacancy concentration of around [Formula: see text] in the confined [Formula: see text] membrane. Our results highlight that interfacial redox-reactions can be induced in [Formula: see text] membranes, which enables the ionic engineering of confined oxide heterointerfaces based on the freestanding oxide approach.

Scientific ReportsVol. 15(1)
Universidad Complutense de Madrid (ES), Forschungszentrum Jülich (DE), Ernst Ruska Centre (DE), Jülich Aachen Research Alliance (DE)
Deutsche Forschungsgemeinschaft, Bundesministerium für Bildung und Forschung
Openalex Percentile: Top 32%
Electronic and Structural Properties of Oxides
0.52
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