TID Characterization of COTS HEMT GaN Transistors: An In Situ Study of Static and Dynamic Parameters up to 100 krad of Co-60 Gamma Radiation

Gallium nitride (GaN) technology has emerged as a transformative solution in the semiconductor industry due to its exceptional performance in high-power and high-frequency applications. With its inherent radiation resilience, GaN is particularly suited for environments such as space electronics and nuclear instrumentation. While static parameter testing under radiation has been extensively studied, dynamic parameter degradation—including propagation delays, rise/fall times, and efficiency losses—remains underexplored. These dynamic characteristics are useful for applications requiring precise timing, signal integrity, and rapid response, such as satellite communication and nuclear systems. This study evaluates the radiation resilience of three commercially available GaN transistors during a 100-krad (Si) Co-60 gamma irradiation campaign, with a focus on both static and dynamic parameters. Static parameters, such as threshold voltage and <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state resistance, exhibited minimal degradation, while a larger change was observed in gate current. In contrast, dynamic parameters revealed smaller changes, including faster propagation delays and reduced efficiency, with variability observed across device types. The findings support a device-specific co-design of transistors and driver electronics for radiation-tolerant power stages.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-10-08
DOI
https://doi.org/10.1109/ted.2025.3617030
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

TID Characterization of COTS HEMT GaN Transistors: An In Situ Study of Static and Dynamic Parameters up to 100 krad of Co-60 Gamma Radiation

Iztok Kramberger, Bojan Kotnik, Lorenzo Gonzales, Nejc Kosanič et al.
IEEE Transactions on Electron Devices
GaN-based semiconductor devices and materials
article

TID Characterization of COTS HEMT GaN Transistors: An In Situ Study of Static and Dynamic Parameters up to 100 krad of Co-60 Gamma Radiation

Iztok Kramberger, Bojan Kotnik, Lorenzo Gonzales, Nejc Kosanič, Matic Erker, Gregor Kirbiš
article en

Abstract

Gallium nitride (GaN) technology has emerged as a transformative solution in the semiconductor industry due to its exceptional performance in high-power and high-frequency applications. With its inherent radiation resilience, GaN is particularly suited for environments such as space electronics and nuclear instrumentation. While static parameter testing under radiation has been extensively studied, dynamic parameter degradation—including propagation delays, rise/fall times, and efficiency losses—remains underexplored. These dynamic characteristics are useful for applications requiring precise timing, signal integrity, and rapid response, such as satellite communication and nuclear systems. This study evaluates the radiation resilience of three commercially available GaN transistors during a 100-krad (Si) Co-60 gamma irradiation campaign, with a focus on both static and dynamic parameters. Static parameters, such as threshold voltage and <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state resistance, exhibited minimal degradation, while a larger change was observed in gate current. In contrast, dynamic parameters revealed smaller changes, including faster propagation delays and reduced efficiency, with variability observed across device types. The findings support a device-specific co-design of transistors and driver electronics for radiation-tolerant power stages.

IEEE Transactions on Electron DevicesVol. 72(12)
University of Maribor (SI)
Openalex Percentile: Top 82%
GaN-based semiconductor devices and materials
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