Integrated Charge Pump in 180 nm SOI Technology for a Silicon Drift Detector
This paper presents a novel biasing method for a silicon drift detector (SDD). The presented integrated circuit in 180nm silicon-on-insulator (SOI) technology generate negative high-voltages for stable operation of a SDD. The integrated circuit uses a Pelliconi charge pump operating at a frequency of 10MHz, so that voltages of up to −70V are generated with a SDD-typical load current of 25μA. The simulations have been done with open source tools. To satisfy the rigid noise requirements of SDD-based systems thorough frequency-planning has been performed for the analog and digital signal chain. Operating an SDD module with a high-voltage supply based on a charge pump has been shown to be possible with high resolution.
Authors
- F. Wiest
- W. Buttler
- Tobias Michel
- Linus Maurer (ORCID: https://orcid.org/0000-0002-0723-3558)
- Peter Iskra
Institutions
- Universität der Bundeswehr München (DE)
- München Klinik (DE)
- GEF Ingenieur (Germany) (DE)
Publication Details
- Published
- 2025-09-24
- DOI
- https://doi.org/10.1109/austrochip67945.2025.11183717
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 0.00