Advanced three-dimensional single-shot photolithography technique for fine microstructure printing based on an edge-tuned grayscale photomask

Grayscale photolithography enables single-shot fabrication of polymeric three-dimensional (3D) microstructures but is inherently limited by edge smoothing, reducing the resolution of sharp features critical for functional applications. We present an advanced single-shot photolithography method integrating an edge-tuning strategy, in which a tunable filter adjusts photomask edge gray levels via amplitude and standard deviation parameters. This approach produces sharply defined and structurally accurate microstructures without multi-step processing. Demonstrations include improved edge accuracy, uniform layer thickness, and functional 3D architectures, highlighting the method's potential for applications requiring both geometric precision and manufacturing efficiency.