Optimization of C2PSA Module in YOLOv11 Architecture for Semiconductor Wafer Inspection

Conventional YOLO-based methods for wafer defect detection increasingly struggle to satisfy the precision and efficiency demands of advanced semiconductor manufacturing processes. To tackle this challenge, this study proposes a refined YOLOv11 architecture integrated with an enhanced C2PSA module, aiming to simultaneously improve detection accuracy and inference speed. Specifically, the key innovations are as follows: replacing standard normalization layers with DynamicTan (Dyt) to significantly enhance training stability and efficiency, incorporating Token Statistics Self-Attention (TSSA) to reduce computational complexity from quadratic to linear while strengthening the modeling of long-range dependencies, implementing a Multi-cognitive Visual Adapter (Mona) to optimize feature distributions and thus improve visual signal processing performance, and augmenting the C2PSA module with a Spatially-Enhanced Feed-forward Network (SEFN) to refine the modeling of local spatial details. Experimental validation on the WM-811k benchmark dataset shows that, compared with the baseline YOLOv11n, the proposed architecture achieves respective improvements of 4.28% in [email protected] and 7.79% in recall rate. These results confirm the superior generalization capability of the proposed method and validate the effectiveness of the designed enhancements for industrial-scale semiconductor inspection systems.

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Publication Details

Published
2025-09-19
DOI
https://doi.org/10.1109/icamechs68051.2025.11180983
Citations
1
Primary Topic
Industrial Vision Systems and Defect Detection
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article
Field-Weighted Citation Impact
1.24
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article

Optimization of C2PSA Module in YOLOv11 Architecture for Semiconductor Wafer Inspection

Qiaoli Zhao, Jun Yu, Jiahao Zhang, Heyu Hu et al.
1 citations
Industrial Vision Systems and Defect Detection
1.24
article

Optimization of C2PSA Module in YOLOv11 Architecture for Semiconductor Wafer Inspection

Qiaoli Zhao, Jun Yu, Jiahao Zhang, Heyu Hu, Shengjun Wen, Jian Yuan
article en
1 citations

Abstract

Conventional YOLO-based methods for wafer defect detection increasingly struggle to satisfy the precision and efficiency demands of advanced semiconductor manufacturing processes. To tackle this challenge, this study proposes a refined YOLOv11 architecture integrated with an enhanced C2PSA module, aiming to simultaneously improve detection accuracy and inference speed. Specifically, the key innovations are as follows: replacing standard normalization layers with DynamicTan (Dyt) to significantly enhance training stability and efficiency, incorporating Token Statistics Self-Attention (TSSA) to reduce computational complexity from quadratic to linear while strengthening the modeling of long-range dependencies, implementing a Multi-cognitive Visual Adapter (Mona) to optimize feature distributions and thus improve visual signal processing performance, and augmenting the C2PSA module with a Spatially-Enhanced Feed-forward Network (SEFN) to refine the modeling of local spatial details. Experimental validation on the WM-811k benchmark dataset shows that, compared with the baseline YOLOv11n, the proposed architecture achieves respective improvements of 4.28% in [email protected] and 7.79% in recall rate. These results confirm the superior generalization capability of the proposed method and validate the effectiveness of the designed enhancements for industrial-scale semiconductor inspection systems.

Zhongyuan University of Technology (CN)
Openalex Percentile: Top 14%
Industrial Vision Systems and Defect Detection
1.24
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Optimization of C2PSA Module in YOLOv11 Architecture for Semiconductor Wafer Inspection — Qiaoli Zhao, Jun Yu, et al. · (2025) | TGRS Research Map | TGRS