Thermal Dissipation in GaN-on-Sapphire Power HEMTs: Synergy of Substrate Thinning and High-Conductivity Thermal Interface Materials

Despite their significant potential for high-power applications, GaN-on-sapphire HEMTs face critical thermal management challenges due to the inherently low thermal conductivity of sapphire substrates. This study investigates the thermal performance of GaN-on-sapphire and GaN-on-Si HEMTs through finite element simulations of flip-chip ball grid array (FC-BGA) packaging. Simulation results reveal that substrate thinning effectively mitigates the impact of thermal conductivity on junction temperature differences between GaN-on-sapphire and GaN-on-Si devices. Reducing the substrate thickness to 0.1 mm narrows the junction temperature gap to merely 0.355°C. Furthermore, optimization of thermal interface materials (TIMs) demonstrates unique advantages for GaN-on-sapphire configurations. The electrically insulating nature of sapphire substrates permits the use of high-thermal-conductivity metal-based TIMs, whereas silicon substrates are restricted to insulating TIMs (≤ 10 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>) to avoid electrical risks. At a 0.1 mm substrate thickness, GaN-on-sapphire HEMTs exhibit thermal performance equivalent to GaN-on-Si HEMTs when using a 15 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup> TIM. Increasing the TIM's thermal conductivity to 50 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup> further reduces the junction temperature to 91.977°C. Transient thermal cycling analysis confirms the robustness of this synergistic design approach. These results highlight promising applications for high-power-density systems, such as electric vehicle fast-charging infrastructure.

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Published
2025-08-15
DOI
https://doi.org/10.1109/wipda-asia63772.2025.11184084
Primary Topic
Thermal properties of materials
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article

Thermal Dissipation in GaN-on-Sapphire Power HEMTs: Synergy of Substrate Thinning and High-Conductivity Thermal Interface Materials

Cungang Hu, Xi Tang, Kun Tan, Suxia Guo et al.
Thermal properties of materials
article

Thermal Dissipation in GaN-on-Sapphire Power HEMTs: Synergy of Substrate Thinning and High-Conductivity Thermal Interface Materials

Cungang Hu, Xi Tang, Kun Tan, Suxia Guo, Jie Lü, Wenping Cao, Zhaofu Zhang, Junsong Jiang, Chang Liu
article en

Abstract

Despite their significant potential for high-power applications, GaN-on-sapphire HEMTs face critical thermal management challenges due to the inherently low thermal conductivity of sapphire substrates. This study investigates the thermal performance of GaN-on-sapphire and GaN-on-Si HEMTs through finite element simulations of flip-chip ball grid array (FC-BGA) packaging. Simulation results reveal that substrate thinning effectively mitigates the impact of thermal conductivity on junction temperature differences between GaN-on-sapphire and GaN-on-Si devices. Reducing the substrate thickness to 0.1 mm narrows the junction temperature gap to merely 0.355°C. Furthermore, optimization of thermal interface materials (TIMs) demonstrates unique advantages for GaN-on-sapphire configurations. The electrically insulating nature of sapphire substrates permits the use of high-thermal-conductivity metal-based TIMs, whereas silicon substrates are restricted to insulating TIMs (≤ 10 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>) to avoid electrical risks. At a 0.1 mm substrate thickness, GaN-on-sapphire HEMTs exhibit thermal performance equivalent to GaN-on-Si HEMTs when using a 15 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup> TIM. Increasing the TIM's thermal conductivity to 50 W•m⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup>•K⁻<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1</sup> further reduces the junction temperature to 91.977°C. Transient thermal cycling analysis confirms the robustness of this synergistic design approach. These results highlight promising applications for high-power-density systems, such as electric vehicle fast-charging infrastructure.

Anhui University (CN), Hefei Institutes of Physical Science (CN), Wuhan University (CN)
Openalex Percentile: Top 78%
Thermal properties of materials
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