Trapping Dynamics and Endurance in HfO <sub>2</sub> -FeFETs: An Insight From Charge Pumping

Authors

Gautham Kumar (ORCID: https://orcid.org/0000-0002-5095-3331)
Yannick Raffel (ORCID: https://orcid.org/0000-0001-8629-5206)
Bhaswar Chakrabarti (ORCID: https://orcid.org/0000-0003-0623-3895)
Agniva Paul
Sourav De (ORCID: https://orcid.org/0000-0002-1930-8799)
Konrad Seidel (ORCID: https://orcid.org/0009-0003-5889-4414)
Asim Senapati
Apu Das
Sk Masud Rana
C. C. Cheng
Padovani Andrea
Lederer Maximilian

Institutions

University of Modena and Reggio Emilia (IT)
Indian Institute of Technology Madras (IN)
National Tsing Hua University (TW)
Fraunhofer Institute for Photonic Microsystems (DE)
Powerchip (Taiwan) (TW)

Publication Details

Journal: IEEE Electron Device Letters
Published: 2025-09-19
DOI: https://doi.org/10.1109/led.2025.3612323
Citations: 2
Primary Topic: Ferroelectric and Negative Capacitance Devices
Type: article
Field-Weighted Citation Impact: 1.46

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article

Trapping Dynamics and Endurance in HfO ₂ -FeFETs: An Insight From Charge Pumping

Gautham Kumar, Yannick Raffel, Bhaswar Chakrabarti, Agniva Paul et al.

Sep 19, 2025

2 citations

IEEE Electron Device Letters

Ferroelectric and Negative Capacitance Devices

1.46

article

Trapping Dynamics and Endurance in HfO ₂ -FeFETs: An Insight From Charge Pumping

Gautham Kumar, Yannick Raffel, Bhaswar Chakrabarti, Agniva Paul, Sourav De, Konrad Seidel, Asim Senapati, Apu Das, Sk Masud Rana, C. C. Cheng, Padovani Andrea, Lederer Maximilian

September 19, 2025article en

2 citations

Abstract

No abstract available for this paper.

IEEE Electron Device LettersVol. 46(11)

University of Modena and Reggio Emilia (IT), Indian Institute of Technology Madras (IN), National Tsing Hua University (TW), Fraunhofer Institute for Photonic Microsystems (DE), Powerchip (Taiwan) (TW)

Openalex Percentile: Top 15%

Ferroelectric and Negative Capacitance Devices

1.46

DOI Source OpenAlex

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