Edge‐Passivated Monolayer WSe<sub>2</sub> Nanoribbon Transistors (Adv. Mater. 39/2024)

Edge-Passivated 2D Nanoribbon Transistors In article number 2313694, Sihan Chen, Rashid Bashir, Arend M. van der Zande, and co-workers report a facile edge passivation method for p-type monolayer WSe2 nanoribbon transistors. The edge-passivated nanoribbons demonstrate improved hole mobility and hole doping compared to their microribbon counterparts.

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Publication Details

Journal
Advanced Materials
Published
2024-09-01
DOI
https://doi.org/10.1002/adma.202470315
Primary Topic
2D Materials and Applications
Type
article
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article

Edge‐Passivated Monolayer WSe2 Nanoribbon Transistors (Adv. Mater. 39/2024)

Arend M. van der Zande, Rashid Bashir, William P. King, Sihan Chen et al.
Advanced Materials
2D Materials and Applications
article

Edge‐Passivated Monolayer WSe2 Nanoribbon Transistors (Adv. Mater. 39/2024)

Arend M. van der Zande, Rashid Bashir, William P. King, Sihan Chen, Yue Zhang
article en

Abstract

Edge-Passivated 2D Nanoribbon Transistors In article number 2313694, Sihan Chen, Rashid Bashir, Arend M. van der Zande, and co-workers report a facile edge passivation method for p-type monolayer WSe2 nanoribbon transistors. The edge-passivated nanoribbons demonstrate improved hole mobility and hole doping compared to their microribbon counterparts.

Advanced MaterialsVol. 36(39)
University of Illinois Urbana-Champaign (US)
Openalex Percentile: Top 82%
2D Materials and Applications
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