Retraction notice to "Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon" [Heliyon 9 (2023) e23105]
Authors
Alexandre A. Vetcher (ORCID: https://orcid.org/0000-0002-4828-8571)
Retraction notice to "Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon" [Heliyon 9 (2023) e23105]
Alexandre A. Vetcher, P. Sivaprakash, Sankaran Esakki Muthu, Raja Venkatesan et al.
Journal
Heliyon
Topics
Advanced Nanomaterials in Catalysis
article
Retraction notice to "Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon" [Heliyon 9 (2023) e23105]
Alexandre A. Vetcher, P. Sivaprakash, Sankaran Esakki Muthu, Raja Venkatesan, Ikhyun Kim, Mohammad Rafe Hatshan, Seong‐Cheol Kim
article en
Abstract
No abstract available for this paper.
Publication Tag
HeliyonVol. 11(15)
Institutions
Peoples' Friendship University of Russia (RU), King Saud University (SA), Keimyung University (KR), Yeungnam University (KR), Karpagam Academy of Higher Education (IN)
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Retraction notice to "Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon" [Heliyon 9 (2023) e23105] — Alexandre A. Vetcher, P. Sivaprakash, et al. · Heliyon (2025) | TGRS Research Map | TGRS