Weak-disturbance imaging and characterization of ultra-confined optical near fields

Ultra-confined optical fields are of great importance in fundamental optics and optical technologies. The extreme field confinement in ultra-small nanostructures presents significant challenges in direct near-field characterization. Conventional scanning near-field optical microscopy encounters difficulties in characterizing sub-10-nm confined light fields due to significant disturbances of the optical field caused by the probe. Here, by employing a high spatial-resolved photoemission electron microscopy (PEEM), we succeeded in imaging the ultra-confined near fields of a nanoslit mode in a coupled nanowire pair (CNP) with weak disturbance for the first time and demonstrating a quasi-three-dimensional field distribution of the nanoslit mode. We also show that a PEEM image can identify fabrication defects that are influential to the confined field but are imperceptible to many other means. These results open an opportunity for weak-disturbance characterization of ultra-confined optical near fields, which is an essential step toward future optical devices or technology relying on ultra-confined light.

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Publication Details

Journal
Light Science & Applications
Published
2025-10-04
DOI
https://doi.org/10.1038/s41377-025-01951-6
Citations
1
Primary Topic
Near-Field Optical Microscopy
Type
article
Field-Weighted Citation Impact
0.67

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Weak-disturbance imaging and characterization of ultra-confined optical near fields

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Weak-disturbance imaging and characterization of ultra-confined optical near fields

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article en
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Abstract

Ultra-confined optical fields are of great importance in fundamental optics and optical technologies. The extreme field confinement in ultra-small nanostructures presents significant challenges in direct near-field characterization. Conventional scanning near-field optical microscopy encounters difficulties in characterizing sub-10-nm confined light fields due to significant disturbances of the optical field caused by the probe. Here, by employing a high spatial-resolved photoemission electron microscopy (PEEM), we succeeded in imaging the ultra-confined near fields of a nanoslit mode in a coupled nanowire pair (CNP) with weak disturbance for the first time and demonstrating a quasi-three-dimensional field distribution of the nanoslit mode. We also show that a PEEM image can identify fabrication defects that are influential to the confined field but are imperceptible to many other means. These results open an opportunity for weak-disturbance characterization of ultra-confined optical near fields, which is an essential step toward future optical devices or technology relying on ultra-confined light.

Light Science & ApplicationsVol. 14(1)
King University (US), Zhejiang A & F University (CN), Shanxi University (CN), Peking University (CN), Jiaxing University (CN), Collaborative Innovation Center of Quantum Matter (CN), Zhejiang University (CN)
National Natural Science Foundation of China, National Key Research and Development Program of China, National Cancer Institute, Natural Science Foundation of Zhejiang Province
Openalex Percentile: Top 26%
Near-Field Optical Microscopy
0.67
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