Analyses of the influences of camera parameters of relay-projection microscopic telescopy
Long-distance, high-resolution microscopic imaging technologies have extensive and significant applications in fields such as target detection and recognition, biomedical imaging, and industrial inspection. However, achieving both long-distance and high-resolution imaging remains a technical bottleneck in the field of optical imaging. Our team recently proposed a novel computational imaging method — relay-projection microscopic telescopy (rPMT)—which utilizes relay projection and non-line-of-sight spatial power spectrum acquisition to achieve spatial resolution that far exceeds the diffraction limit of camera lenses used. This paper presents further analyses of the rPMT system, discussing the impact of camera parameters on imaging spatial resolution and object-plane field of view (FOV) through theoretical analysis and experiments. Experimental results indicate that, under constant pixel size, increasing the number of pixels leads to enhanced spatial resolution while maintaining the object-plane FOV. Conversely, under a constant pixel count, increasing pixel size reduces the FOV while improving spatial resolution. Additionally, when the sensor size remains unchanged, increasing pixel size results in a smaller FOV. If the pixel size becomes excessively large, the object FOV may become insufficient to cover the target, leading to a ringing effect that deteriorates both imaging quality and spatial resolution. This research is significant for the application of rPMT technology. On one hand, it allows for the analysis of the required pixel size, pixel count, and the distance between the camera and relay screen based on actual resolution and FOV requirements, facilitating the selection of an appropriate camera model. On the other hand, for rPMT systems using specific cameras, it enables the analysis of achievable spatial resolution and FOV. In summary, this study is crucial for optimizing the performance of rPMT and its applications in biomedical imaging, industrial inspection, and other fields.
Authors
- Xin He (ORCID: https://orcid.org/0000-0002-2163-8172)
- Qi Huang (ORCID: https://orcid.org/0000-0001-7870-0507)
- Nan Gu (ORCID: https://orcid.org/0009-0002-2156-1918)
- Xiujian Li (ORCID: https://orcid.org/0000-0001-9244-7958)
- Meicheng Fu (ORCID: https://orcid.org/0000-0002-3101-3088)
- Haifei Zhang (ORCID: https://orcid.org/0000-0001-5142-5824)
- Siyu Liu
- Yi Zhang (ORCID: https://orcid.org/0000-0002-5867-9322)
- Wenjun Yi
- Yubo Luo (ORCID: https://orcid.org/0000-0003-1621-3767)
- Yao Xu (ORCID: https://orcid.org/0000-0003-3100-3370)
- Xin Chen (ORCID: https://orcid.org/0000-0002-5115-6481)
Institutions
- National University of Defense Technology (CN)
Publication Details
- Published
- 2025-10-03
- DOI
- https://doi.org/10.1117/12.3086574
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00