Navigating plasma etching of photonic chips in shared cleanrooms: a practical tutorial for researchers

Abstract The research and commercialization of integrated photonic devices have seen rapid growth, driven by their broad applicability and importance in both technological innovation and fundamental research. Among the key steps in the fabrication of such devices, plasma etching plays a critical role in fabrication of high optical quality integrated photonic devices. This work presents a practical tutorial for developing a robust plasma etching process from the ground up, specifically within the constraints of a shared academic semiconductor cleanroom—an environment often limited in resources and process isolation. Key topics covered include chamber preparation, selection of etch chemistries and process parameters, mask material considerations, and techniques for characterizing etch quality. Strategies for achieving process repeatability and post-etch enhancements to improve optical performance are also discussed. This tutorial is intended to serve as a starting point for graduate students and researchers working on the fabrication of photonic integrated circuits in academic settings.