Preparation of Microlens Array Using Excimer Laser Motion Mask

In order to optimize the preparation process of microlens arrays, improve preparation efficiency, and reduce preparation costs, 248 nm KrF excimer laser direct writing is combined with a motion mask to prepare microlens arrays on PMMA substrates. Firstly, a specific exposure mask based on the contour characteristics of the microlens unit was designed, and the preparation principle was analyzed. Using COMSOL Multiphysics 6.3 simulation software, a microlens preparation model was built to intuitively describe the process of preparing microlenses by the motion mask method. Secondly, a preparation system was built, and the laser processing technology was optimized. Finally, microlens arrays were prepared based on the optimized process, and an optical microscope and white-light interferometer were used to observe their morphology. The experimental results show that this method can effectively prepare cylindrical and circular microlens arrays. The width of the cylindrical microlens array unit exceeded 90 μm, the height was 7.08 μm, and the roughness was 0.09 μm. The diameter of the circular microlens array unit was φ100 μm, the height was 4 μm, and the curvature radius was 230 μm. The geometric dimensions of the mask can be adjusted to obtain microlens units of the desired size, achieving personalized preparation of microlens arrays. The excimer laser motion mask method can prepare various types of microlens arrays, and the array units have a high consistency and high surface quality, which helps to improve the efficiency, flexibility, stability, and specificity of microlens array preparation.