STRUCTURE OF THIN TITANIUM NITRIDE FILMS DEPOSITED BY MAGNETRON SPUTTERING

This review paper is focused on the structure of thin titanium nitride films formed by magnetron sputtering. A model of film growth depending on the deposition temperature and nitrogen flow is considered. This model is compared with experimental results. The effect of annealing on the structure of titanium nitride films is described.

Authors

A. G. Isaev (ORCID: https://orcid.org/0000-0002-4445-6355)

Publication Details

Journal: Микроэлектроника / Russian Microelectronics
Published: 2025-01-01
DOI: https://doi.org/10.7868/s3034548025030029
Primary Topic: Metal and Thin Film Mechanics
Type: article
Field-Weighted Citation Impact: 0.00

Controls

|||

ALL TIME

JAN

FEB

MAR

APR

MAY

JUN

JUL

AUG

SEP

OCT

article

STRUCTURE OF THIN TITANIUM NITRIDE FILMS DEPOSITED BY MAGNETRON SPUTTERING

A. G. Isaev

Jan 1, 2025

Микроэлектроника / Russian Microelectronics

Metal and Thin Film Mechanics

article

STRUCTURE OF THIN TITANIUM NITRIDE FILMS DEPOSITED BY MAGNETRON SPUTTERING

A. G. Isaev

January 1, 2025article en

Abstract

Микроэлектроника / Russian MicroelectronicsVol. 54(3)

Openalex Percentile: Top 69%

Metal and Thin Film Mechanics

DOI Source OpenAlex

AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

STRUCTURE OF THIN TITANIUM NITRIDE FILMS DEPOSITED BY MAGNETRON SPUTTERING — A. G. Isaev · Микроэлектроника / Russian Microelectronics (2025) | TGRS Research Map | TGRS