High-Precision Beam Deflection and Diagnostics System for EUV Synchrotron Radiation Illumination

The EUV light emitted by the synchrotron radiation source exhibits a stable wavelength and pollution-free characteristics, making it highly suitable for technical verification in diverse EUV lithography applications and playing a pivotal role in EUV lithography industry research. To guide the EUV light from the beamline into the experimental platform, this paper proposes a deflection system design based on the Shanghai Synchrotron Radiation Facility (SSRF). This system enables beamline diagnostics for EUV light while facilitating precise positioning and performance testing of the Mo/Si multilayer planar deflection mirror. The deflection system achieves accurate installation and alignment through a coordinate transfer protocol. By imaging the EUV incident light spot on a scintillator and analyzing variations in EUV light intensity data before and after the deflection mirror, the system can accurately measure focused light spot parameters from the beamline and achieve submicron alignment accuracy with 10 μrad angular resolution for the deflection mirror. The proposed design provides valuable insights for advancing EUV lithography technology utilizing synchrotron radiation sources.