Local insulator-to-superconductor transition in amorphous InO_<i>x</i> films modulated by e-beam irradiation

Abstract We present a novel method enabling precise post-fabrication modulation of the electrical resistance in micrometer-scale regions of amorphous indium oxide (a-InO x ) films. By subjecting initially insulating films to an electron beam at room temperature, we demonstrate that the exposed region of the films becomes superconducting. The resultant superconducting transition temperature ( T c ) is adjustable up to 2.8 K by changing the electron dose and accelerating voltage. This technique offers a compelling alternative to traditional a-InO x annealing methods for both fundamental investigations and practical applications. Moreover, it empowers independent adjustment of electrical properties across initially identical a-InO x samples on the same substrate, facilitating the creation of superconducting microstructures with precise T c control at the micrometer scale. Some possible mechanisms for the observed resistance modifications are discussed.