A Novel Asymmetric High-Performance MEMS Pendulum Capacitive Accelerometer

In this study, we propose a novel asymmetric high-performance MEMS pendulum accelerometer comprising a sensitive structure and an interface circuit. The sensitive structure, designed with asymmetric mass blocks, significantly improves both sensitivity and structural stability. The sensor is fabricated using a double-side polished (100) N-type silicon wafer and its structure is ultimately realized through ICP (Inductively Coupled Plasma) etching. We also develop and fabricate the corresponding interface circuit. The accelerometer is evaluated through a static field roll-over test, demonstrating excellent performance with a sensitivity of 1.247 V/g and a nonlinearity of 0.8% within the measurement range of -2 g to 2 g.

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Publication Details

Journal
Micromachines
Published
2025-09-30
DOI
https://doi.org/10.3390/mi16101122
Primary Topic
Advanced MEMS and NEMS Technologies
Type
article
Field-Weighted Citation Impact
0.00

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article

A Novel Asymmetric High-Performance MEMS Pendulum Capacitive Accelerometer

Jia Jiang, Weixin Wu, Haitao Liu, Zhentao Zhang et al.
Micromachines
Advanced MEMS and NEMS Technologies
article

A Novel Asymmetric High-Performance MEMS Pendulum Capacitive Accelerometer

Jia Jiang, Weixin Wu, Haitao Liu, Zhentao Zhang, Jin Cao, Zhang Gao, Guangxian Dong
article en

Abstract

In this study, we propose a novel asymmetric high-performance MEMS pendulum accelerometer comprising a sensitive structure and an interface circuit. The sensitive structure, designed with asymmetric mass blocks, significantly improves both sensitivity and structural stability. The sensor is fabricated using a double-side polished (100) N-type silicon wafer and its structure is ultimately realized through ICP (Inductively Coupled Plasma) etching. We also develop and fabricate the corresponding interface circuit. The accelerometer is evaluated through a static field roll-over test, demonstrating excellent performance with a sensitivity of 1.247 V/g and a nonlinearity of 0.8% within the measurement range of -2 g to 2 g.

MicromachinesVol. 16(10)
Chongqing University (CN), China Electronics Technology Group Corporation (CN), Chongqing Metrology Quality Inspection and Research Institute (CN)
Centre Scientifique et Technique du Bâtiment
Openalex Percentile: Top 74%
Advanced MEMS and NEMS Technologies
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