A 180-nm Voltage-Controlled Magneto-Electric RAM With Sub-1-ns Switching Time
Memory performance has emerged as a critical factor influencing both system speed and energy efficiency. However, conventional memory technologies such as embedded Flash (eFlash) and static RAM (SRAM) encounter significant scalability limitations beyond the 28-nm CMOS node. Among novel emerging memory technologies, spin-transfer-torque magnetic RAM (STT-MRAM) has gained prominence due to its high-speed operation, non-volatility, and superior endurance, positioning it as a promising candidate for storage-class and cache memory applications. Nevertheless, the energy-intensive write mechanism of STT-MRAM poses a fundamental limitation to its broader adoption. In this work, we present the first CMOS-integrated implementation of a novel memory technology called the magneto-electric RAM (MeRAM) that utilizes voltage-controlled magnetic anisotropy (VCMA) for write operations, achieving sub-nanosecond switching speeds and ultralow energy consumption. The integration process, associated challenges, and circuit solutions are thoroughly discussed, including the development of a unique memory access circuitry tailored for MeRAM. The experimental results from multiple MeRAM chips fabricated in a 180-nm CMOS process are provided, showcasing key device characteristics and memory performance metrics. This work demonstrates the first fully operational, CMOS-integrated MeRAM chips, achieving sub-1-ns switching time, 8.85-pJ/bit write energy, and 1.95-pJ/bit read energy in a 180-nm CMOS technology node.
Authors
- Sudhakar Pamarti (ORCID: https://orcid.org/0000-0003-1457-7508)
- Haris Suhail (ORCID: https://orcid.org/0009-0003-8890-6770)
- Jiyue Yang (ORCID: https://orcid.org/0000-0002-6328-7032)
- Vinod Kurian Jacob (ORCID: https://orcid.org/0000-0001-6005-8165)
- Haoran He (ORCID: https://orcid.org/0000-0003-4282-2283)
- Kang L. Wang (ORCID: https://orcid.org/0000-0002-9363-1279)
Institutions
- Taiwan Semiconductor Manufacturing Company (United States) (US)
- University of California, Los Angeles (US)
- Taiwan Semiconductor Manufacturing Company (Taiwan) (TW)
- Nvidia (United States) (US)
Publication Details
- Journal
- IEEE Journal of Solid-State Circuits
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1109/jssc.2025.3609342
- Primary Topic
- Magnetic properties of thin films
- Type
- article
- Field-Weighted Citation Impact
- 0.00