Type-I Band Engineering of van der Waals InSe/TiS<sub>3</sub> Heterostructures for Broadband and Polarization-Sensitive Photodetection with a Large Dichroic Ratio
van der Waals (vdW) heterostructures formed from two-dimensional (2D) layered materials have opened promising avenues in broadband photodetection, particularly in polarization-sensitive applications. Previous research indicates that type-I heterostructures hold considerable potential for broadband polarization photodetector development; however, achieving high polarization sensitivity in these vdW heterostructures has remained insufficiently explored. In this work, we systematically present combined theoretical and experimental studies on designing and fabricating a high-performance photodetector based on the InSe/TiS<sub>3</sub> vdW heterostructure exhibiting type-I band alignment. Theoretical studies supported by experimental verification confirmed the presence of a type-I band alignment between InSe and TiS<sub>3</sub>. Leveraging this favorable band alignment, the fabricated device demonstrated broadband photodetection spanning the deep ultraviolet to near-infrared spectral range along with pronounced polarization sensitivity. The photodetector exhibited superior performance metrics, including a high responsivity of 55 A/W<sup>-1</sup>, detectivity of 1.80 × 10<sup>13</sup> Jones, an external quantum efficiency reaching 15,633%, and a rapid response time of approximately 23.6 μs. Additionally, significant polarization sensitivity was observed, characterized by a notable dichroic ratio of approximately 5, emphasizing the device's potential for advanced optoelectronic applications. This study provides valuable insights and a practical reference for the development of high-performance polarized photodetectors across a broad spectral range.
Authors
- Y C Wu (ORCID: https://orcid.org/0009-0002-7311-1505)
- Yu. Yu. Illarionov (ORCID: https://orcid.org/0000-0003-4323-1389)
- Muhammad Zubair Nawaz (ORCID: https://orcid.org/0000-0002-0598-4315)
- Yi Fang (ORCID: https://orcid.org/0000-0003-0268-3362)
- Qijie Liang (ORCID: https://orcid.org/0000-0003-4252-7997)
- Majeed Ur Rehman (ORCID: https://orcid.org/0000-0003-0054-5214)
- Jingqing Huang
- Zhiming M. Wang (ORCID: https://orcid.org/0000-0001-7847-7704)
- Waqas Ahmad (ORCID: https://orcid.org/0000-0002-0938-9193)
- Vijay Laxmi (ORCID: https://orcid.org/0000-0001-9388-6813)
Institutions
- University of Electronic Science and Technology of China (CN)
- Sun Yat-sen University (CN)
- Shenzhen University (CN)
- Chinese Academy of Sciences (CN)
- Southern University of Science and Technology (CN)
- Songshan Lake Materials Laboratory (CN)
Publication Details
- Journal
- ACS Applied Materials & Interfaces
- Published
- 2025-09-29
- DOI
- https://doi.org/10.1021/acsami.5c13903
- Citations
- 10
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 5.18