A hyperparameter-fusion neural networks for deposition prediction

As integrated circuit manufacturing processes develop into the nanometer scale, precise control and prediction of the deposition process have become crucial. Nanoscale manufacturing imposes unprecedentedly high demands on film quality, uniformity, and consistency, presenting significant challenges to traditional control and prediction methodologies. This study proposes a novel approach that, for the first time, formulates the thin-film deposition process as a video prediction task, enabling the use of deep learning for morphological forecasting under varying process conditions, and introduces a novel hyperparameter-fusion neural network, referred to as DepositionNet (DepoNet). Unlike conventional video prediction models, DepoNet specifically accounts for the influence of deposition parameters on the entire simulation process. We have incorporated a novel Hyper Projector that allows the model to flexibly adapt to varying deposition conditions and material characteristics. Through comprehensive comparative experimental analyses, we demonstrate that DepoNet significantly outperforms existing deep-learning models and achieves a mean squared error of 17.34, representing a 3.67% improvement over the second best model and a 1,435 × speedup over physics-based methods, thereby validating its exceptional generalization capability. Extensive experiments reveal that the model maintains high performance even under conditions of limited training data, for instance, achieving a peak signal-to-noise ratio (PSNR) of 41.516 decibels (dB) when trained with only 20% of the available data.