Ab initio study of doping effects on the ferroelectric and piezoelectric properties of ZrO₂

Ferroelectric binary oxides show great promise for application in energy storage, non-volatile memories, and neuromorphic computing devices. Compared to hafnia (HfO 2 ), zirconia (ZrO 2 ) thin films have been understudied in spite of significant recent progress. Doping has emerged as a promising tool to tune the ferroelectric properties of HfO 2 and Hf x Zr 1-x O 2 (HZO). However, an extensive study of the effects of doping on the structural and ferroelectric properties of ZrO 2 is still widely missing. In this study, through density functional theory (DFT) and ab initio molecular dynamics (AIMD) calculations we investigate the effects of B, Si, Al, Mg, Sc, Ca, Ce, Ta, Hf, Y, Sr, La, Ba and Rb doping on the structural distortions, relative phase stability, phase transition temperatures, spontaneous polarization and piezoelectric response of the monoclinic (m-), polar orthorhombic (o-) and tetragonal (t-) phases of ZrO 2 at 3.125 and 6.25 cat% doping concentration. We demonstrate that the spontaneous polarization magnitude in ZrO₂ can be significantly enhanced through doping with Si, B, and Al. In addition, our results reveal that the relative phase stability and phase transition temperatures of ZrO₂ can be tuned by doping. Specifically, our calculations confirm that Si doping promotes the stabilization of the t-phase in ZrO₂. Furthermore, we show that doping shifts the phase transition temperature, leading to substantial improvements in piezoelectric response, with up to a sevenfold increase observed in Al-doped ZrO₂. Consequently, this work highlights the most promising dopants capable of enhancing the ferroelectric and piezoelectric properties of ZrO₂ thin films.

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Publication Details

Journal
Acta Materialia
Published
2025-09-27
DOI
https://doi.org/10.1016/j.actamat.2025.121584
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
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article

Ab initio study of doping effects on the ferroelectric and piezoelectric properties of ZrO₂

Alfred Kersch, Alexandre Silva, Veniero Lenzi, Richard Ganser et al.
Acta Materialia
Ferroelectric and Negative Capacitance Devices
article

Ab initio study of doping effects on the ferroelectric and piezoelectric properties of ZrO₂

Alfred Kersch, Alexandre Silva, Veniero Lenzi, Richard Ganser, José Silva
article en

Abstract

Ferroelectric binary oxides show great promise for application in energy storage, non-volatile memories, and neuromorphic computing devices. Compared to hafnia (HfO 2 ), zirconia (ZrO 2 ) thin films have been understudied in spite of significant recent progress. Doping has emerged as a promising tool to tune the ferroelectric properties of HfO 2 and Hf x Zr 1-x O 2 (HZO). However, an extensive study of the effects of doping on the structural and ferroelectric properties of ZrO 2 is still widely missing. In this study, through density functional theory (DFT) and ab initio molecular dynamics (AIMD) calculations we investigate the effects of B, Si, Al, Mg, Sc, Ca, Ce, Ta, Hf, Y, Sr, La, Ba and Rb doping on the structural distortions, relative phase stability, phase transition temperatures, spontaneous polarization and piezoelectric response of the monoclinic (m-), polar orthorhombic (o-) and tetragonal (t-) phases of ZrO 2 at 3.125 and 6.25 cat% doping concentration. We demonstrate that the spontaneous polarization magnitude in ZrO₂ can be significantly enhanced through doping with Si, B, and Al. In addition, our results reveal that the relative phase stability and phase transition temperatures of ZrO₂ can be tuned by doping. Specifically, our calculations confirm that Si doping promotes the stabilization of the t-phase in ZrO₂. Furthermore, we show that doping shifts the phase transition temperature, leading to substantial improvements in piezoelectric response, with up to a sevenfold increase observed in Al-doped ZrO₂. Consequently, this work highlights the most promising dopants capable of enhancing the ferroelectric and piezoelectric properties of ZrO₂ thin films.

Acta MaterialiaVol. 301
Munich University of Applied Sciences (DE), Sprachen & Dolmetscher Institut München (DE), University of Minho (PT)
Openalex Percentile: Top 74%
Ferroelectric and Negative Capacitance Devices
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