Reconfigurable Magnetotransport in MnBi <sub>2</sub> Te <sub>4</sub> via Gate and Magnetic Field Tuning
The intrinsic magnetic topological insulator MnBi<sub>2</sub>Te<sub>4</sub> is a promising platform for exploring quantum phases with nontrivial band topology and for enabling electrical control over coupled magnetic and electronic phase transitions. In-plane magnetic fields, in particular, offer a distinct means of tuning these properties by strengthening quantized Hall effects, enhancing surface energy gaps, and driving spin reorientation transitions. However, a systematic understanding of how such fields affect magnetotransport is limited. Here, the magnetotransport behavior of few-layer MnBi<sub>2</sub>Te<sub>4</sub> as a function of gate voltage, temperature, and magnetic field angle, with a primary focus on in-plane field effects, are investigated. A gate-tunable crossover in magnetoresistance is observed from positive to negative values under in-plane magnetic fields as the gate voltage is swept below the charge neutrality point at temperatures below the Néel temperature. The in-plane field drives a transition from the antiferromagnetic ground state to a ferromagnetic configuration with spins aligned in-plane, while simultaneously altering the electronic structure, as revealed by gate-dependent transport features. The angle-dependent measurements reveal strongly gate-tunable magnetotransport anisotropy. These results establish in-plane magnetic fields as an effective tuning parameter for modulating spin and charge transport in MnBi<sub>2</sub>Te<sub>4</sub>, advancing prospects for reconfigurable spintronic and topological devices.
Authors
- Jiaqiang Yan (ORCID: https://orcid.org/0000-0001-6625-4706)
- Dmitry Ovchinnikov (ORCID: https://orcid.org/0000-0002-8971-1639)
- Takashi Taniguchi (ORCID: https://orcid.org/0000-0003-0017-7669)
- Yijie Lin
- Kenji Watanabe (ORCID: https://orcid.org/0000-0001-6249-8666)
- Y. X. Jie
- Xiaofan Cai
- Ahmet Avsar
Institutions
- Oak Ridge National Laboratory (US)
- University of Kansas (US)
- National University of Singapore (SG)
- National Institute for Materials Science (JP)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-09-26
- DOI
- https://doi.org/10.1002/adma.202510734
- Citations
- 1
- Primary Topic
- Topological Materials and Phenomena
- Type
- article
- Field-Weighted Citation Impact
- 1.25
Funders
- U.S. Department of Energy
- National Research Foundation
- Ministry of Education, Culture, Sports, Science and Technology
- Office of Science
- Japan Society for the Promotion of Science
- Basic Energy Sciences
- Core Research for Evolutional Science and Technology
- Oak Ridge National Laboratory