Methodology for Improving Temperature Sensing Performance and Thermal Stability of 4H‐SiC JBS Diodes
In harsh industrial conditions, real-time and precise temperature monitoring is vital for system safety and efficiency, necessitating high-precision, durable, and reliable temperature sensors. However, developing sensors that balance high sensitivity with thermal reliability is challenging. Herein, high-sensitivity and high-linearity devices for high-temperature applications are successfully achieved by designing and fabricating 4H-SiC Junction Barrier Schottky (JBS) diodes. Notably, after 36 h aging at 500 °C, diodes with small active areas achieve a maximum sensitivity (S) of 1.65 mV °C<sup>-1</sup>, with only a 6.8% reduction relative to the pristine device, while maintaining high linearity (R<sup>2</sup> > 0.999) over a broad current range (500 µA-2 mA). Specially, large active area diodes achieve the highest S of 2.24 mV °C<sup>-1</sup> among the reported Schottky-based devices. In addition, a critical aspect is the in-depth investigation of degradation mechanisms governing the performance degradation after high-temperature aging over 200-500 °C. The findings identify the presence of a 12 nm-thick interfacial layer and the significant increase in the interface state density between the titanium layer and 4H-SiC following aging at 500 °C. These results provide valuable methodologies for improving temperature sensing performance and thermal stability of 4H-SiC JBS Diodes.
Authors
- Li Zhao (ORCID: https://orcid.org/0000-0002-4000-7165)
- Shizhong Yue (ORCID: https://orcid.org/0000-0003-2389-5348)
- Y. B. Chen
- Jinyi Xu (ORCID: https://orcid.org/0000-0003-3004-2706)
- Yu Huang (ORCID: https://orcid.org/0000-0002-9360-0843)
- Zhengran Liu
- Feng Zhang (ORCID: https://orcid.org/0000-0002-1163-2498)
- Zhijie Wang (ORCID: https://orcid.org/0000-0002-3216-8620)
- Guoliang Zhang (ORCID: https://orcid.org/0000-0002-7371-3349)
- Zhanwei Shen
- Xuan Tang (ORCID: https://orcid.org/0000-0003-0489-8922)
Institutions
- Institute of Semiconductors (CN)
- University of Chinese Academy of Sciences (CN)
- Xiamen University of Technology (CN)
Publication Details
- Journal
- Small
- Published
- 2025-09-27
- DOI
- https://doi.org/10.1002/smll.202509679
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00