Beyond the Beam: Exploring Charged Particle Nanoprinting

Abstract Charged particle nanoprinting using electrons and ions has advanced significantly, presenting vast opportunities for both scientific research and industrial applications. This perspective outlines the fundamental principles of these processes to provide context for recent advancements and suggests strategies to ensure that these well‐established techniques continue progressing in the rapidly evolving field of nanoprinting. Despite substantial progress, fundamental challenges remain, requiring further optimization. In Focused Electron Beam Induced Deposition (FEBID) and Focused Ion Beam Induced Deposition (FIBID), the tailoring of precursor molecules is crucial for achieving high‐purity materials or composites with specific functional properties. Optimizing ligand stability, fragmentation efficiency, and bond strength in precursors necessitates refined precursor design and careful selection of deposition parameters. For instance, the use of reactive ions in plasma FIB/SEM systems, for example, offers promising opportunities for expanding FIBID's role in material engineering. Furthermore, the microstructures of both as‐grown and processed nanodeposits are analyzed and discussed considering fundamental driving forces. Additionally, hybrid techniques utilizing nanoprinted materials for the fabrication of heterostructures with tailored and diverse functional properties are explored. This rapidly advancing field of nanoprinting thrives on interdisciplinary collaboration, fostering innovation, and pushing the limits of nanoscale manufacturing.