Recent Advances in Graphitic Carbon Nitride-Based Materials in the Photocatalytic Degradation of Emerging Contaminants

The increasing presence of emerging contaminants (ECs) has attracted considerable attention due to their potential harm to human health and ecosystems. Graphitic carbon nitride (g-C3N4), a semiconductor devoid of metals, stands out due to its distinctive optical properties and strong resistance to chemical degradation, which holds significant promise in the photocatalytic degradation of ECs. However, the inherent limitations of g-C3N4, such as its reduced specific surface area and the swift recombination of photogenerated electron-hole pairs, have prompted extensive research on modification strategies to enhance its photocatalytic performance. Current research on g-C3N4-based materials is often constrained in scope, with most reviews focusing solely on modification strategies or its application in degrading a single category of emerging contaminants (ECs). In this review, a systematic overview of synthesis methods and advanced modification strategies for g-C3N4-based materials is discussed, highlighting their recent advances in the photocatalytic degradation of various ECs using g-C3N4-based materials, which underscores their potential for environmental remediation. Moreover, this article critically examines the current challenges and outlines future research directions, with particular emphasis on integrating artificial intelligence and machine learning to accelerate the development of g-C3N4-based photocatalysts and optimize degradation processes, thereby promoting their efficient application in the photocatalytic degradation of ECs.

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Publication Details

Journal
Inorganics
Published
2025-09-26
DOI
https://doi.org/10.3390/inorganics13100319
Citations
2
Primary Topic
Advanced Photocatalysis Techniques
Type
article
Field-Weighted Citation Impact
0.73
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article

Recent Advances in Graphitic Carbon Nitride-Based Materials in the Photocatalytic Degradation of Emerging Contaminants

Heshan Cai, Junbao He, Feng Chen, Zhuhong Chen et al.
2 citations
Inorganics
Advanced Photocatalysis Techniques
0.73
article

Recent Advances in Graphitic Carbon Nitride-Based Materials in the Photocatalytic Degradation of Emerging Contaminants

Heshan Cai, Junbao He, Feng Chen, Zhuhong Chen, Xinyi Tang, Yajuan Feng, Zuhong He, Shuwen Han, Xiaojuan Chen, Weiyu Huang, Yaokai Wen, Zhenyi Li, Daguang Li, Danning Xu
article en
2 citations

Abstract

The increasing presence of emerging contaminants (ECs) has attracted considerable attention due to their potential harm to human health and ecosystems. Graphitic carbon nitride (g-C3N4), a semiconductor devoid of metals, stands out due to its distinctive optical properties and strong resistance to chemical degradation, which holds significant promise in the photocatalytic degradation of ECs. However, the inherent limitations of g-C3N4, such as its reduced specific surface area and the swift recombination of photogenerated electron-hole pairs, have prompted extensive research on modification strategies to enhance its photocatalytic performance. Current research on g-C3N4-based materials is often constrained in scope, with most reviews focusing solely on modification strategies or its application in degrading a single category of emerging contaminants (ECs). In this review, a systematic overview of synthesis methods and advanced modification strategies for g-C3N4-based materials is discussed, highlighting their recent advances in the photocatalytic degradation of various ECs using g-C3N4-based materials, which underscores their potential for environmental remediation. Moreover, this article critically examines the current challenges and outlines future research directions, with particular emphasis on integrating artificial intelligence and machine learning to accelerate the development of g-C3N4-based photocatalysts and optimize degradation processes, thereby promoting their efficient application in the photocatalytic degradation of ECs.

InorganicsVol. 13(10)
Foshan University (CN), Shunde Polytechnic (CN)
Openalex Percentile: Top 28%
Advanced Photocatalysis Techniques
0.73
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