Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
Authors
- Esteban Pedrueza‐Villalmanzo (ORCID: https://orcid.org/0000-0001-9433-2417)
- Aldo Jesorka (ORCID: https://orcid.org/0000-0002-6733-6911)
- Rui Liu (ORCID: https://orcid.org/0000-0001-6353-6193)
Institutions
- Chalmers University of Technology (SE)
Publication Details
- Journal
- Scientific Reports
- Published
- 2025-09-25
- DOI
- https://doi.org/10.1038/s41598-025-19744-7
- Citations
- 1
- Primary Topic
- Microfluidic and Capillary Electrophoresis Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.67