USE OF CHROME FILMS FOR MANUFACTURING PHOTOTEMPLATES AND CODE DISCS FOR PHOTOELECTRIC MEASURING SYSTEMS

The peculiarities of applying chromium melts during the preparation of photomasks and code disks that are used in photovoltaic dimming systems were investigated. It has been noted that the procedure of applying thin chrome flakes on the lining gap can have a wide range of hardening effects in photolithography and microprocessing of the surface, which implies the relevance of improving this type of technology to ensure the possibility of equal to the technical department. In this case, the optical power of chromium melts was investigated in the context of organizing a photolithographic procedure. The presence of the transmittance coefficient of ultraviolet vibration in the chromium ball was determined, which allows us to formulate methodological recommendations for photolithographic production. The application of the chromium deposition method to its optical characteristics is examined, as well as the deposition spectra of current photomasks are aligned, with significant indicators of effectiveness for a wide range of exposures. An assessment was made of the productivity of the high-speed infrared worm gear for exposing photomasks of modulation disks of encoders. It has been shown that stagnation of infrared cores ensures stability of the exposure process and reduces the energy consumption and performance of the photolithographic complex. Nowadays, it has been identified that there is a need to increase the thickness of the chrome molten material to compensate for the reduced level of claying in the low-voltage part of the spectrum, which is confirmed by the analysis of the claying spectra for various types of spittle. The influence of the technology of deposition of thin chromium slabs on the parameters of photomasks, spectacle, microstructure, optical and electrical characteristics was also examined. The methods of physical vapor deposition, chemical vapor deposition and electron-metal deposition, which are used for forming chrome smelts of various materials, are analyzed. The integration of process parameters into the microstructure, beating coefficients, polishing and pitomy operations was observed. It is shown that chromium films can serve as an alternative to transparent conductive oxides due to better electrical conductivity, stability of properties and resistance to aggressive operating conditions. A two-stage technology for sputtering chromium films has been developed to ensure high optical density and low surface roughness. Optimal film formation modes have been determined to improve their adhesion to the glass substrate. The proposed approach provides stable coating parameters for use in photomasks. It is noted that the quality of substrate cleaning and control of technological parameters are of key importance for the formation of defects in chromium films. It is found that mechanical stresses and contamination can cause punctures, local delamination and changes in optical density. Optimal sputtering modes are proposed that minimize internal stresses and improve the quality of photomasks.