Preparation of single-phase (Cr, Zn)(N, O) by double substitution of ZnO into CrN: evaluation of hardness

Abstract Solid-solution hardening by the addition of other elements is a known method for enhancing the hardness of transition-metal nitrides such as chromium nitride (CrN) and titanium nitride (TiN), of which structure are NaCl-type (B1). In this study, we attempted to synthesize a novel single-phase (Cr, Zn)(N, O) thin film by the solid-solution substitution of zinc oxide (ZnO), which adopts the same B1 structure under high pressure, into the CrN lattice. Cr–Zn–N–O thin films with various ZnO contents were deposited onto MgO substrates using pulsed laser deposition. Compositional analysis confirmed that the thin films consisted only of Cr, Zn, N, and O. X-ray diffraction patterns suggested the formation of single-phase B1-(Cr, Zn)(N, O) in the thin film. The hardness of the (Cr, Zn)(N, O) thin film reached 23 GPa, representing a 28% increase over that of a CrN thin film (18 GPa) deposited under identical conditions.

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Publication Details

Journal
Japanese Journal of Applied Physics
Published
2025-09-24
DOI
https://doi.org/10.35848/1347-4065/ae0ae2
Primary Topic
Metal and Thin Film Mechanics
Type
article
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article

Preparation of single-phase (Cr, Zn)(N, O) by double substitution of ZnO into CrN: evaluation of hardness

Tsuneo Suzuki, Kenta Suitani
Japanese Journal of Applied Physics
Metal and Thin Film Mechanics
article

Preparation of single-phase (Cr, Zn)(N, O) by double substitution of ZnO into CrN: evaluation of hardness

Tsuneo Suzuki, Kenta Suitani
article en

Abstract

Abstract Solid-solution hardening by the addition of other elements is a known method for enhancing the hardness of transition-metal nitrides such as chromium nitride (CrN) and titanium nitride (TiN), of which structure are NaCl-type (B1). In this study, we attempted to synthesize a novel single-phase (Cr, Zn)(N, O) thin film by the solid-solution substitution of zinc oxide (ZnO), which adopts the same B1 structure under high pressure, into the CrN lattice. Cr–Zn–N–O thin films with various ZnO contents were deposited onto MgO substrates using pulsed laser deposition. Compositional analysis confirmed that the thin films consisted only of Cr, Zn, N, and O. X-ray diffraction patterns suggested the formation of single-phase B1-(Cr, Zn)(N, O) in the thin film. The hardness of the (Cr, Zn)(N, O) thin film reached 23 GPa, representing a 28% increase over that of a CrN thin film (18 GPa) deposited under identical conditions.

Japanese Journal of Applied PhysicsVol. 64(10)
Nagaoka University of Technology (JP)
Openalex Percentile: Top 70%
Metal and Thin Film Mechanics
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