Etch Rate Dependence of Optical Loss in Silicon Photonics

Quantum photonic integrated circuits are emerging as a prominent research area due to their potential in quantum communications and quantum computing. In these systems, minimizing optical loss is critical as photon loss directly results in irreversible degradation of encoded quantum information, which cannot be restored by amplification due to the no-cloning theorem. Here, we introduce a straightforward yet effective optimization strategy for reducing the propagation loss of silicon waveguides by controlling the etching rate during fabrication. Systematic experimental results demonstrate a clear inverse correlation between etching rate and propagation loss. Specifically, we successfully reduced the propagation loss from 3.2 dB/cm to 1.55 dB/cm in a 500-nm-wide, half-etched silicon waveguide. This simple optimization technique provides a practical and scalable solution for fabricating low-loss quantum photonic integrated circuits.

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Publication Details

Journal
IEEE Photonics Technology Letters
Published
2025-09-24
DOI
https://doi.org/10.1109/lpt.2025.3613844
Citations
2
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
1.46
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article

Etch Rate Dependence of Optical Loss in Silicon Photonics

Yeolheon Seong, Heedeuk Shin
2 citations
IEEE Photonics Technology Letters
Photonic and Optical Devices
1.46
article

Etch Rate Dependence of Optical Loss in Silicon Photonics

Yeolheon Seong, Heedeuk Shin
article en
2 citations

Abstract

Quantum photonic integrated circuits are emerging as a prominent research area due to their potential in quantum communications and quantum computing. In these systems, minimizing optical loss is critical as photon loss directly results in irreversible degradation of encoded quantum information, which cannot be restored by amplification due to the no-cloning theorem. Here, we introduce a straightforward yet effective optimization strategy for reducing the propagation loss of silicon waveguides by controlling the etching rate during fabrication. Systematic experimental results demonstrate a clear inverse correlation between etching rate and propagation loss. Specifically, we successfully reduced the propagation loss from 3.2 dB/cm to 1.55 dB/cm in a 500-nm-wide, half-etched silicon waveguide. This simple optimization technique provides a practical and scalable solution for fabricating low-loss quantum photonic integrated circuits.

IEEE Photonics Technology LettersVol. 38(1)
Pohang University of Science and Technology (KR)
Openalex Percentile: Top 15%
Photonic and Optical Devices
1.46
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