Influence of technostress on work engagement and workplace flourishing: the mediating role of perceived organizational support
The study addresses the role of perceived organisational support (POS) in the relationship between technostress and positive work outcomes (workplace flourishing and work engagement) from the perspective of the Stress-Strain Model using a sample of 302 university employees in South Africa. Using a structural equation model done using AMOS version 22, results revealed that technostress had a negative significant direct effect on work engagement but had no statistically significant direct effect on workplace flourishing. POS had a positive and significant direct effect on work engagement as well as workplace flourishing. POS also partially mediates the relationship between technostress and work engagement whilst fully mediating the relationship between technostress and workplace flourishing. POS lessens the negative impact of technostress on work engagement and completely buffers its effects on workplace flourishing. These findings highlight the importance of ICT support on positive work outcomes in digitised hybrid and virtual work settings. They also present theoretical and practical implications for management to improve workplace flourishing and engagement in the new world of work. Results shows that technostress undermines work engagement and flourishing, so organisations should implement practical support measures including training, clear guidance and manageable technology use to help employees cope and maintain well-being and engagement.
Authors
- Martha Harunavamwe (ORCID: https://orcid.org/0000-0002-1211-1619)
- Chené Ward
- Tatenda Marange
Institutions
- University of the Free State (ZA)
- Division of Human Resource Management (US)
- University of Pretoria (ZA)
Publication Details
- Journal
- Cogent Psychology
- Published
- 2025-09-22
- DOI
- https://doi.org/10.1080/23311908.2025.2561437
- Citations
- 2
- Primary Topic
- Technostress in Professional Settings
- Type
- article
- Field-Weighted Citation Impact
- 4.88