EUV source improvements for brightness and debris mitigation

Ushio Inc.'s LDP (Laser-assisted Discharge-produced Plasma) EUV source is a system to generate EUV from discharged plasma triggered by laser on a rotating electrode disc which is coated by liquid tin. The LDP source can generate repetitive pulsed high-current discharge up to 10 kHz (15 kW) and equipped with a debris filter to protect the optics from the tin debris emitted from the plasma. The LDP EUV source can offer excellent light performance for various applications in the semiconductor manufacturing ecosystems including Actinic Patterned Mask Inspection (APMI) and beamline (test exposure systems) applications.