Dynamics of Forward Bias-Induced On-State Parameter Shift in p-NiO/β-Ga <sub>2</sub> O <sub>3</sub> Heterojunction Diodes
For the first time, we investigate the parameter shift related to <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state reliability in p-NiO/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $</tex-math> </inline-formula>-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> heterojunction diodes (HJDs) under forward bias stress (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {stress}}$</tex-math> </inline-formula>). It was found that increasing stress voltage induces the varying trend of parameter shift. The dynamics of minority hole behavior and defect ionic movement were revealed from the dependence of parameter shift on the stress voltage and time. For <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {stress}}$</tex-math> </inline-formula> of 3 V, holes accumulated due to the hole barrier formed by the valence band offset <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {E}_{V}$</tex-math> </inline-formula>, leading to the decrease in turn-on voltage <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {on}}$</tex-math> </inline-formula>. As <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {stress}}$</tex-math> </inline-formula> increased from 4 to 6 V, it was demonstrated that the trap-filling process of massive injected holes led to the trap-filled-limited (TFL) regime and space-charge-limited current (SCLC) regime, resulting in significantly decreased differential <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-resistance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on,sp}}$</tex-math> </inline-formula>, as well as increased <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {on}}$</tex-math> </inline-formula> and decreased average ideal factor <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$n$</tex-math> </inline-formula>. At higher forward bias (>6 V), the accumulated negative defect ions shielded the trapped holes and formed a resistance region at the interface that limited the carrier injection, thus increasing <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {on}}$</tex-math> </inline-formula>, average <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$n$</tex-math> </inline-formula>, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on,sp}}$</tex-math> </inline-formula>. The unique heterojunction (HJ) degradation behavior and its underlying mechanism are of great value for the structure optimization of p-NiO/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $</tex-math> </inline-formula>-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> HJ to achieve improved reliability.
Authors
- Haodong Hu (ORCID: https://orcid.org/0000-0002-1139-1209)
- Zheng‐Dong Luo (ORCID: https://orcid.org/0000-0003-3725-4912)
- Bochang Li (ORCID: https://orcid.org/0000-0002-8195-6842)
- Cizhe Fang (ORCID: https://orcid.org/0009-0005-9466-0919)
- Genquan Han (ORCID: https://orcid.org/0000-0001-5140-4150)
- Chunxiao Yu
- Xiaoxi Li (ORCID: https://orcid.org/0009-0008-6901-9494)
- Xiaole Jia
- Yan Liu (ORCID: https://orcid.org/0000-0001-5583-0587)
- Yibo Wang (ORCID: https://orcid.org/0000-0002-4058-1319)
- Chenyu Liu (ORCID: https://orcid.org/0009-0006-7784-5230)
- Yue Hao (ORCID: https://orcid.org/0000-0002-8081-2919)
- Jiandong Ye (ORCID: https://orcid.org/0000-0002-3985-6768)
Institutions
- Xidian University (CN)
- Nanjing University (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-09-23
- DOI
- https://doi.org/10.1109/ted.2025.3610332
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00