Scalable waveplate for ultraviolet applications using laser-imprinted birefringence in silica

A method for fabrication of large-aperture waveplate suitable for operation in the near-ultraviolet spectral region is demonstrated. The waveplate was fabricated using femtosecond direct laser writing of bulk fused silica. This method enables the precise control of the induced birefringence, which is introduced via the generation of nanopores with geometrical features that are controlled by the laser processing parameters. The resulting structures also introduce a small loss of transmission that is on the order of 4% at 351 nm. The laser-induced-damage threshold in the nanosecond regime was found to approach that of the native fused-silica substrate, which makes it a suitable candidate for polarization control in laser fusion research applications.