More nodes to be covered by multi-beam mask writers: MBM-2000C for mature nodes
MBM-2000C has been released in Q2 2025 for mature nodes. It is equipped with the writing modes to expose the main field with 3-5 hours and adequate writing accuracy. Writing modes can be switched seamlessly without re-calibration of beam to cover a wide range of mature nodes from 45 nm to 7 nm. MBM-2000C has the fidelity control function which allows the fine-tuning of the patterning resolution for pattern fidelity changing.
Authors
- Jumpei Yasuda (ORCID: https://orcid.org/0009-0005-7039-2075)
- Masashi Uchiya
- Masato Saito (ORCID: https://orcid.org/0009-0003-7436-7446)
- Hiroshi Matsumoto (ORCID: https://orcid.org/0000-0002-0166-3469)
- Issei Aibara
- Yoshinori Kojima
- Shunji Isaji
Publication Details
- Published
- 2025-09-23
- DOI
- https://doi.org/10.1117/12.3066074
- Primary Topic
- Electron and X-Ray Spectroscopy Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00