Seamless 2D-MoS2/3D-Si heterojunction for white light detection Application

In this study, we investigate the quality of junction formation and its impact on the electronic and optoelectronic properties of two-dimensional (2D) multilayered molybdenum disulfide (MoS₂) films directly grown on three-dimensional (3D) p-type silicon (p-Si) (110) substrates. Large-area (15 mm × 15 mm), few-layer (8-10 layers) MoS₂films were synthesized using a facile vapor-phase transport method, achieving seamless integration with the underlying Si substrate. Comprehensive structural and morphological characterizations confirm the uniform growth of multilayer 2D-MoS₂and the formation of a well-defined 2D/3D MoS₂/Si heterojunction interface. The vertical MoS₂/Si heterostructure exhibits a maximum photocurrent of ∼2.131 × 10^-6A and a responsivity of ∼13.31 A W^-1under white light illumination of 20<i>µ</i>W cm^-2at a bias voltage of -3 V. These results highlight the critical role of engineered heterointerfaces in enhancing device performance, including improved adhesion and charge transport across the active layers. This work demonstrates the feasibility of integrating a variety of 2D materials, including 2D-MoS₂, with silicon platforms for complementary metal oxide semiconductor (CMOS) compatible optoelectronic applications. The findings present promising opportunities for developing next-generation photosensors, photodetectors, p-n heterojunction diodes, and vertical junction transistors based on 2D/3D hybrid architectures.