Development of a Table-Top High-Power, High-Stability, High-Harmonic-Generation Extreme-Ultraviolet Laser Source

In this study, we present the development of a high-average-power, exceptionally stable extreme-ultraviolet (EUV) laser source based on a high-order harmonic generation (HHG) technique. The spectrum of an ytterbium-doped laser is broadened through self-phase modulation (SPM) in a gas-filled hollow fiber and compressed down to 25.3 fs for efficient harmonic generation. The high harmonics are generated in a krypton (Kr) gas cell, delivering a total power of 241 μW within the 30–60 nm spectral range, corresponding to a single harmonic output of 166 μW at a central wavelength of 46.8 nm. Notably, the system demonstrates good power stability with a root-mean-square (RMS) deviation of only 1.95% over 12 h of continuous operation. This advanced light source holds great potential for applications in nano- and quantum-material development and in semiconductor wafer defect detection. Future work aims to further enhance the output power in the 30–60 nm band to the milliwatt level, which would significantly bolster scientific research and technological development in related fields.