Exploring the structural, electronic, and transport properties in thickness-dependent two-dimensional Ga<sub>2</sub>O<sub>3</sub> induced by native defects
Understanding the effects of native oxygen vacancy (V<sub>O</sub>) and gallium vacancy (V<sub>Ga</sub>) in two-dimensional (2D) Ga<sub>2</sub>O<sub>3</sub>semiconductors is critical for optimizing device efficiency and developing innovative applications. In this work, the structural stability, electronic structure, carrier mobility and conductivity of thickness-dependent 2D Ga<sub>2</sub>O<sub>3</sub>induced by native V<sub>O</sub>and V<sub>Ga</sub>are systematically studied. In Ga<sub>2</sub>O<sub>3</sub>V<sub>O</sub>configuration, the newly occupied mid-gap states primarily composed of O-2p, Ga-3p, and Ga-3d orbitals are formed, demonstrating a deep donor feature. The created impurity levels lower the bandgaps of monolayer, bilayer, and trilayer Ga<sub>2</sub>O<sub>3</sub>V<sub>O</sub>to 1.60, 1.64, and 1.53 eV, respectively. The electron mobility exhibits a high value up to ∼12 154.89 cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup>in bilayer Ga<sub>2</sub>O<sub>3</sub>V<sub>O</sub>. Shallow acceptor states primarily composed of O-2p and Ga-3d orbitals are introduced for Ga<sub>2</sub>O<sub>3</sub>V<sub>Ga</sub>configuration, suggesting the effective p-type doping behavior. The bandgaps of monolayer, bilayer, and trilayer Ga<sub>2</sub>O<sub>3</sub>V<sub>Ga</sub>are of respectively 2.31, 1.90, and 1.84 eV, accompanying with the monotonous decreasing of hole mobilities from 261.46-85.75 cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup>along<i>x</i>-direction. Meanwhile, the thickness dependent n-type and p-type conductivities are endowed with the similar trends as those of carrier mobilities. Distinct dimensional induced band features and transport properties have been resolved in V<sub>O</sub>and V<sub>Ga</sub>cases. The high carrier mobility and strong anisotropic observed in vacancy-deficient 2D Ga<sub>2</sub>O<sub>3</sub>highlight the insights into defect engineering strategies for next-generation wide-bandgap semiconductors.
Authors
- Chao Ma (ORCID: https://orcid.org/0000-0002-2879-3239)
- Lijuan Hu (ORCID: https://orcid.org/0000-0003-1869-0372)
- Meng Wu (ORCID: https://orcid.org/0000-0003-4484-1680)
- Hui Zeng (ORCID: https://orcid.org/0000-0002-0729-6604)
- Yanru Xue
Institutions
- Hunan University (CN)
- Xiamen University (CN)
- Hunan University of Science and Engineering (CN)
- Xiamen University of Technology (CN)
Publication Details
- Journal
- Nanotechnology
- Published
- 2025-09-19
- DOI
- https://doi.org/10.1088/1361-6528/ae0941
- Citations
- 1
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.43