Enabling a MULTIGON-based integrated pipelined flow for curvilinear mask process correction and multibeam fracture

As MULTIGON-based flows are evolving, runtime and file size optimization are becoming increasingly important. The MULTIGON record is now a part of the SEMI P49 OASIS extension and is being incorporated across the industry in various lithographic flows. As native processing is being supported across various processes in the lithographic flows, developing an integrated pipelined flow tailored to MULTIGON-based flows could possess various advantages, not limited to resource utilization optimization and eliminating redundant intermediate steps. Curvilinear mask processing steps are challenging owing to complex shapes and increased file sizes. This applies to MULTIGON-based CLMPC (Curvilinear Mask Process Correction) and MULTIGON-based Multibeam fracture. As with PWL (Piece Wise Linear) mask data processing flows, these steps are typically executed sequentially, limiting the optimal utilization of compute resources. Conventional mask data processing requires CLMPC to execute first, followed by Multibeam fracture, which additionally implies that fracture can begin only once CLMPC completes on the entire design. Calibre provides a platform that enables pipelining of CLMPC and Multibeam fracture processes employing task-based pipelining and in-memory processing, which allows for fracture to commence alongside CLMPC and integrates the fracture runtime within the CLMPC processing step. This paper studies a MULTIGON-based integrated pipelined flow designed for CLMPC and Multibeam fracture and its benefits while maintaining accuracy and a suitable output file size.