Volumetric non-destructive imaging of strain in silicon using stimulated Raman scattering at telecom wavelengths

We demonstrate stimulated Raman scattering microscopy for non-destructive, volumetric measurement of residual stresses within silicon wafers, employing a pump beam at 1.56 µm and a Stokes beam at 1.7 µm.

Authors

Hiroyuki Omiya
Yasuyuki Ozeki (ORCID: https://orcid.org/0000-0002-9004-0799)
Masahiro Nomura
Yuki Sano (ORCID: https://orcid.org/0000-0003-0690-1785)
Y. Mita
Kenichi Oguchi (ORCID: https://orcid.org/0000-0003-1110-4609)
S. Itoh
K Tsuji

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/cleo_at.2025.aa118_1
Primary Topic: Spectroscopy Techniques in Biomedical and Chemical Research
Type: article
Field-Weighted Citation Impact: 0.00

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article

Volumetric non-destructive imaging of strain in silicon using stimulated Raman scattering at telecom wavelengths

Hiroyuki Omiya, Yasuyuki Ozeki, Masahiro Nomura, Yuki Sano et al.

Jan 1, 2025

Spectroscopy Techniques in Biomedical and Chemical Research

article

Volumetric non-destructive imaging of strain in silicon using stimulated Raman scattering at telecom wavelengths

Hiroyuki Omiya, Yasuyuki Ozeki, Masahiro Nomura, Yuki Sano, Y. Mita, Kenichi Oguchi, S. Itoh, K Tsuji

January 1, 2025article en

Abstract

Openalex Percentile: Top 82%

Spectroscopy Techniques in Biomedical and Chemical Research

DOI Source OpenAlex

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Volumetric non-destructive imaging of strain in silicon using stimulated Raman scattering at telecom wavelengths — Hiroyuki Omiya, Yasuyuki Ozeki, et al. · (2025) | TGRS Research Map | TGRS