Fabrication of Large Gratings Using Broad-Beam Scanning Exposure Based on Grating’s Profile Symmetry

A broad-beam scanning exposure method utilizing grating’s profile symmetry is proposed to eliminate phase-locking errors introduced by non-uniform photoresist thickness. A 200 mm × 100 mm grating with a 0.097 λ pitch error was fabricated.

Authors

Wentao Zhan (ORCID: https://orcid.org/0000-0002-2615-7642)
Lijiang Zeng

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/cleo_at.2025.aa112_2
Citations: 1
Primary Topic: Advanced Surface Polishing Techniques
Type: article
Field-Weighted Citation Impact: 0.67

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article

Fabrication of Large Gratings Using Broad-Beam Scanning Exposure Based on Grating’s Profile Symmetry

Wentao Zhan, Lijiang Zeng

Jan 1, 2025

1 citations

Advanced Surface Polishing Techniques

0.67

article

Fabrication of Large Gratings Using Broad-Beam Scanning Exposure Based on Grating’s Profile Symmetry

Wentao Zhan, Lijiang Zeng

January 1, 2025article en

1 citations

Abstract

Openalex Percentile: Top 27%

Advanced Surface Polishing Techniques

0.67

DOI Source OpenAlex

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Fabrication of Large Gratings Using Broad-Beam Scanning Exposure Based on Grating’s Profile Symmetry — Wentao Zhan, Lijiang Zeng · (2025) | TGRS Research Map | TGRS