Increasing efficiency of nanostructuring in silica glass with 60 fs pulse duration

The effect of pulse duration on nanolamella-mediated birefringence in fused silica is demonstrated. Shortening pulses to 60 fs improves imprinting efficiency and storage density. Nanolamella formation explains polarization-sensitive laser etching with few pulses.

Authors

Sergei Shevtsov (ORCID: https://orcid.org/0009-0007-5112-0976)
Oleg Pronin (ORCID: https://orcid.org/0000-0002-1132-5148)
Peter G. Kazansky (ORCID: https://orcid.org/0000-0003-1586-789X)
Mario Ochoa (ORCID: https://orcid.org/0000-0003-4870-7390)
Huijun Wang (ORCID: https://orcid.org/0000-0002-2355-6074)

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/cleo_at.2025.aa100_5
Primary Topic: Laser Material Processing Techniques
Type: article
Field-Weighted Citation Impact: 0.00

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article

Increasing efficiency of nanostructuring in silica glass with 60 fs pulse duration

Sergei Shevtsov, Oleg Pronin, Peter G. Kazansky, Mario Ochoa et al.

Jan 1, 2025

Laser Material Processing Techniques

article

Increasing efficiency of nanostructuring in silica glass with 60 fs pulse duration

Sergei Shevtsov, Oleg Pronin, Peter G. Kazansky, Mario Ochoa, Huijun Wang

January 1, 2025article en

Abstract

The effect of pulse duration on nanolamella-mediated birefringence in fused silica is demonstrated. Shortening pulses to 60 fs improves imprinting efficiency and storage density. Nanolamella formation explains polarization-sensitive laser etching with few pulses.

Openalex Percentile: Top 73%

Laser Material Processing Techniques

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Increasing efficiency of nanostructuring in silica glass with 60 fs pulse duration — Sergei Shevtsov, Oleg Pronin, et al. · (2025) | TGRS Research Map | TGRS