Micro-transfer printed Si-LN Bragg Grating modulator
We demonstrate a heterogeneously integrated Si-LN Bragg Grating modulator enabled by micro-transfer printing thin-film lithium niobate (TFLN) onto silicon circuits. The presented device demonstrates low insertion loss <1dB, high extinction ratio of 30dB and an EO bandwidth of 26GHz.
Authors
- Kai-Wen Chen
- Joris Van Kerrebrouck (ORCID: https://orcid.org/0000-0002-6611-7979)
- Dries Van Thourhout (ORCID: https://orcid.org/0000-0003-0111-431X)
- Ying Tan (ORCID: https://orcid.org/0000-0002-2009-8266)
- Shengpu Niu (ORCID: https://orcid.org/0000-0002-0212-6876)
- Tom Vanackere (ORCID: https://orcid.org/0000-0003-4692-9467)
- Günther Roelkens (ORCID: https://orcid.org/0000-0002-4667-5092)
- Nishant Singh (ORCID: https://orcid.org/0000-0003-0609-1145)
- Bart Kuyken (ORCID: https://orcid.org/0000-0002-8745-7833)
- Maximilien Billet (ORCID: https://orcid.org/0000-0002-5784-5050)
- Margot Niels
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/cleo_at.2025.jps100_101
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00