High-NA and High-Efficiency Polarization-Based Metalenses with Pitch Size Control Utilizing Silicon-Rich Nitride

Geometric and propagation phase metalenses, using high-refractive-index silicon-rich nitride, were designed to achieve high numerical apertures (NA) and focusing efficiencies of 17.6% (NA 0.99) and 32.1% (NA 0.97) through pitch size control.

Authors

Alireza Khalilian (ORCID: https://orcid.org/0000-0001-8140-0759)
Bowen Yu (ORCID: https://orcid.org/0009-0008-9642-7880)
Yasha Yi

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/cleo_at.2025.jps100_137
Primary Topic: Semiconductor materials and devices
Type: article
Field-Weighted Citation Impact: 0.00

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article

High-NA and High-Efficiency Polarization-Based Metalenses with Pitch Size Control Utilizing Silicon-Rich Nitride

Alireza Khalilian, Bowen Yu, Yasha Yi

Jan 1, 2025

Semiconductor materials and devices

article

High-NA and High-Efficiency Polarization-Based Metalenses with Pitch Size Control Utilizing Silicon-Rich Nitride

Alireza Khalilian, Bowen Yu, Yasha Yi

January 1, 2025article en

Abstract

Openalex Percentile: Top 75%

Semiconductor materials and devices

DOI Source OpenAlex

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High-NA and High-Efficiency Polarization-Based Metalenses with Pitch Size Control Utilizing Silicon-Rich Nitride — Alireza Khalilian, Bowen Yu, et al. · (2025) | TGRS Research Map | TGRS