Pushing the boundaries of deep UV laser diode technology

AlGaN-based deep ultraviolet (DUV) lasers hold great promise for applications in sterilization, sensing, and precision laser processing due to their compact size, high efficiency, and environmental benefits. However, challenges in crystal growth and current injection have limited their realization. Our research has overcome these hurdles by optimizing epitaxial growth and device design, achieving room temperature continuous-wave operation for the first time. Key innovations, including stress management through tilted mesa structures, have significantly improved device performance by reducing defects. This presentation will highlight these breakthroughs and discuss the remaining challenges in advancing DUV laser technology.

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Publication Details

Published
2025-09-18
DOI
https://doi.org/10.1117/12.3063050
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

Pushing the boundaries of deep UV laser diode technology

Ziyi Zhang, Koji Aoto, Akira Yoshikawa, Hiroshi Amano et al.
GaN-based semiconductor devices and materials
article

Pushing the boundaries of deep UV laser diode technology

Ziyi Zhang, Koji Aoto, Akira Yoshikawa, Hiroshi Amano, Maki Kushimoto, Chiaki Sasaoka, Yoshio Honda
article en

Abstract

AlGaN-based deep ultraviolet (DUV) lasers hold great promise for applications in sterilization, sensing, and precision laser processing due to their compact size, high efficiency, and environmental benefits. However, challenges in crystal growth and current injection have limited their realization. Our research has overcome these hurdles by optimizing epitaxial growth and device design, achieving room temperature continuous-wave operation for the first time. Key innovations, including stress management through tilted mesa structures, have significantly improved device performance by reducing defects. This presentation will highlight these breakthroughs and discuss the remaining challenges in advancing DUV laser technology.

Asahi Kasei (Japan) (JP), Nagoya University (JP)
Openalex Percentile: Top 84%
GaN-based semiconductor devices and materials
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Pushing the boundaries of deep UV laser diode technology — Ziyi Zhang, Koji Aoto, et al. · (2025) | TGRS Research Map | TGRS