X-ray mirror polishing at atomic-level accuracy using PMMA tools in water
WAPOP developed by the authors successfully demonstrated the atomic-level planarization of silicon, achieving an RMS surface roughness of 0.5 Å using PMMA in a water-only environment. Given its simplicity and particle-free nature, this method shows great potential for achieving the extreme precision required for processing x-ray mirrors.
Authors
- Satoru Egawa (ORCID: https://orcid.org/0000-0003-0509-597X)
- Jianli Guo (ORCID: https://orcid.org/0000-0002-0364-283X)
- Hiroto Motoyama (ORCID: https://orcid.org/0000-0001-7113-9614)
- Takuya Hosobata (ORCID: https://orcid.org/0000-0002-3174-3232)
- Hidekazu Mimura (ORCID: https://orcid.org/0000-0003-4623-6951)
Institutions
- Nitto RIKEN (Japan) (JP)
- The University of Tokyo (JP)
Publication Details
- Published
- 2025-09-18
- DOI
- https://doi.org/10.1117/12.3062079
- Primary Topic
- Advanced X-ray and CT Imaging
- Type
- article
- Field-Weighted Citation Impact
- 0.00