Fast Throughput Multilayer Lithography for Volumetric Meta-Optics
We present a precursor-based direct write method using conventional electron beam lithography for a fast multilayer fabrication with metal chalcogenides. We demonstrate volumetric metamaterials both with classical design and inverse design using antimony sulfide.
Authors
- Ian Foo
- Phillippe Pearson (ORCID: https://orcid.org/0009-0000-0547-6989)
- Andrei Faraon (ORCID: https://orcid.org/0000-0002-8141-391X)
- A. Bilgehan Baspinar
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/cleo_fs.2025.ff152_8
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00