Electron multibeam mask writer for mature nodes: MBM-2000C

The electron multi-beam mask writer MBMTM-2000C has been released in Q2 2025 for the mask production of mature nodes. It is designed under the concept of a single system of the electron multi-beam mask writer with capability to cover a wide range of mature nodes. It is realized based on the system of MBM-2000 with the optimized configuration and the newly developed writing functions. It is equipped with the three writing modes adequate for mature node mask writing. The combination of the writing modes and the beam current density of 2.5 A/cm² inherited from MBM-2000 leads to the typical writing time of 3 - 5 hours for the main field area. The writing modes can be switched seamlessly without recalibration of beam offering high flexibility in mask production. MBM-2000C is also equipped with the fidelity control function as the knob to loosen the patterning resolution upon customers’ need.