Laser powder bed fusion of pure silver sputtering target: process, microstructure, and sputtering performance

• A large-scale Ag target sample with a diameter of 50.8 mm and a thickness of 5 mm was successfully fabricated by additive manufacturing for the first time. • The grain size of Ag target was refined to 3–7 μm and hardness increased by 45.1 % compared to currently available commercial products. • The h / v value is a key factor affecting the additive manufacturing of pure silver. • The defects of Ag target were reduced from 14.7% to 0.2% by adjusting the h / v value to 1.0E-04. Silver (Ag) sputtering targets are crucial in electronic information materials, particularly with the rapid advancement of Artificial Intelligence (AI), which has further increased their demand. However, the extremely high reflectivity and poor laser absorption of pure Ag in the infrared range make it challenging to process using conventional laser-based Additive Manufacturing (AM) systems, limiting its wide application. In this study, a novel hatch spacing-to-scanning speed ratio ( h / v )-centered low-energy–density strategy was proposed to overcome this challenge and enable high-quality additive manufacturing of pure Ag. By optimizing the ( h / v ) value to 1.0E-04, we successfully fabricated dense, low-defect Ag sputtering targets without increasing energy input. The results demonstrated that this method significantly shortened the manufacturing cycle and produced high-performance Ag targets with refined grains (3–7 μm), high density (≥99.8 %), a smooth surface (Ra = 11.5 μm), and stable sputtering performance (sputtering rate = 31.8 nm/min). Furthermore, the hardness increased by 45.1 % compared to Ag targets prepared by traditional methods. This work offers a practical pathway for applying laser-based AM in the production of highly reflective metal sputtering targets, advancing their industrialization in thin-film electronics, while also contributing to the understanding of AM process–structure relationships in metallic materials.

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Journal
Materials & Design
Published
2025-09-16
DOI
https://doi.org/10.1016/j.matdes.2025.114779
Primary Topic
Additive Manufacturing Materials and Processes
Type
article
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article

Laser powder bed fusion of pure silver sputtering target: process, microstructure, and sputtering performance

Yunxiu Chao, Jianfeng Gu, Haozhang Zhong, Qi Tang et al.
Materials & Design
Additive Manufacturing Materials and Processes
article

Laser powder bed fusion of pure silver sputtering target: process, microstructure, and sputtering performance

Yunxiu Chao, Jianfeng Gu, Haozhang Zhong, Qi Tang, Yi He, Yue Shen, Zheda Ning, Ming Wen
article en

Abstract

• A large-scale Ag target sample with a diameter of 50.8 mm and a thickness of 5 mm was successfully fabricated by additive manufacturing for the first time. • The grain size of Ag target was refined to 3–7 μm and hardness increased by 45.1 % compared to currently available commercial products. • The h / v value is a key factor affecting the additive manufacturing of pure silver. • The defects of Ag target were reduced from 14.7% to 0.2% by adjusting the h / v value to 1.0E-04. Silver (Ag) sputtering targets are crucial in electronic information materials, particularly with the rapid advancement of Artificial Intelligence (AI), which has further increased their demand. However, the extremely high reflectivity and poor laser absorption of pure Ag in the infrared range make it challenging to process using conventional laser-based Additive Manufacturing (AM) systems, limiting its wide application. In this study, a novel hatch spacing-to-scanning speed ratio ( h / v )-centered low-energy–density strategy was proposed to overcome this challenge and enable high-quality additive manufacturing of pure Ag. By optimizing the ( h / v ) value to 1.0E-04, we successfully fabricated dense, low-defect Ag sputtering targets without increasing energy input. The results demonstrated that this method significantly shortened the manufacturing cycle and produced high-performance Ag targets with refined grains (3–7 μm), high density (≥99.8 %), a smooth surface (Ra = 11.5 μm), and stable sputtering performance (sputtering rate = 31.8 nm/min). Furthermore, the hardness increased by 45.1 % compared to Ag targets prepared by traditional methods. This work offers a practical pathway for applying laser-based AM in the production of highly reflective metal sputtering targets, advancing their industrialization in thin-film electronics, while also contributing to the understanding of AM process–structure relationships in metallic materials.

Materials & DesignVol. 259
Shanghai Jiao Tong University (CN), Kunming Institute of Precious Metals (CN)
Openalex Percentile: Top 74%
Additive Manufacturing Materials and Processes
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