Investigation of the dynamic response of a fluid dielectric to electric fields for controlled micro- and nanostructuring processes

Fluid photopolymers that actively respond to electric fields offer significant advantages for micro- and nanostructuring. These materials enable individual deformation and subsequent curing of microlenses within a defined electric field. Furthermore, these fluid photopolymers are applied in the replication of micro- and nanostructures using nanoimprint lithography (NIL). By applying an electric field during the NIL process, the filling ratio of structures—especially those with undercuts—can be enhanced, or intentional material gradients in doped NIL materials can be achieved. However, a comprehensive model describing the dielectric response to electric fields is still lacking. To address this, a shadowgraphybased setup is presented to experimentally capture the dynamic behavior of fluid dielectrics. The study investigates key influencing factors, including dielectric volume, electrode spacing, and field intensity. By combining experimental and theoretical approaches, the findings provide deeper insights into the interaction between electric fields and fluid dielectrics, contributing to improved process control in micro- and nanostructuring.